Ruthenium precursors for advanced electronics applications
High‑purity ruthenium (Ru) precursors developed for demanding semiconductor deposition processes
Umicore PMC offers a growing portfolio of high‑purity ruthenium‑based metal‑organic precursors designed for advanced electronics and semiconductor manufacturing. These materials are developed to meet the stringent requirements of modern deposition processes, where purity, reproducibility, and long‑term availability are critical.
Building on Umicore’s integrated access to precious metals and deep organometallic expertise, our ruthenium precursors support reliable scale‑up from R&D to high‑volume manufacturing while ensuring secure and resilient supply chains.
Why Ruthenium?
Ruthenium plays an increasingly important role in advanced semiconductor architectures, particularly where low resistivity, excellent thermal stability, and compatibility with next‑generation patterning concepts are required.
For you as a customer, this means:
- Materials engineered for advanced ALD and CVD processes
- Consistent performance across development and production environments
- Reduced risk through supply‑chain transparency and integrated metal sourcing
Ruthenium product categories
Cyclopentadienyl‑Based Ru(II) Precursors
- Strong thermal stability and controlled reactivity
- Reliable evaporation for stable ALD processes
- Proven choice for uniform, low‑impurity Ru films
Arene–Diene Ru(0) Systems
- Extremely fast nucleation, even on oxides
- Excellent performance in area‑selective ALD
- Clean ligand release ensures smooth, dense, low‑contamination films
Organomodified Ru Carbonyl Complexes
- Very high volatility, ideal for low‑temperature processing
- CO ligands enable clean decomposition
- Produces high‑purity Ru films with minimal carbon incorporation
Tailored Precursor Designs
- Fine‑tuning of nucleation behavior and reactivity
- Reduced impurity formation through engineered ligand chemistry
- Customizable for specific integration, selectivity, and temperature windows
- Tailored ligand compositions
Product portfolio
| PRODUCT NAME | CHEMICAL NAME | OTHER NAMES | CAS NUMBER |
|
Umicore DeRu15 |
Tricarbonyl(η4-2-methylene-1,3-propanediyl)ruthenium | (TMM)Ru(CO)3 | 151989-50-3 |
| Umicore DeRu16 | [Ethanedial-bis(dimethylhydrazone)](p-cymene)-ruthenium(0) | Ru(p-Cymene)(NMe2DAD) | 2408521-59-3 |
| Umicore DeRu19 | Ruthenium, [(1,2,3,4-ε)-1,3-cyclohexadiene][(1,2,3,4,5,6-ε)-1-methyl-4-(1-methylethyl)benzene] | Ru(IMBCH) | 500591-28-6 |
| Umicore DeRu33 | Benzene(1,3-cyclohexadiene)ruthenium(0) | 12215-07-5 | |
| Umicore DeRu40 | Bis(ethylcyclopentadienyl)ruthenium(II) | Ru(CpEt)2 | 32992-96-4 |
| Umicore DeRu42 | Ethylcyclopentadienyl(pyrrolyl)ruthenium(II) | Ru(EtCpPy) | 883284-96-6 |
| Umicore DeRu45 EU only |
Ruthenium,[(1,2,3,4,5,6-ε)-ethylbenzene][(1,2,4,5-ε)-1-ethyl-1,4-cyclohexadiene] | Ru(EBECH) | 1311266-82-6 |
Typical applications
Umicore’s ruthenium precursors are developed for use in advanced metallization and patterning processes, including:
- Atomic Layer Deposition (ALD)
- Chemical Vapor Deposition (CVD)
- Related advanced thin‑film deposition technologies
These processes enable continued device scaling, performance improvements, and reliability in modern semiconductor architectures.
Key benefits for your process
- High‑purity metal‑organic chemistry tailored for electronics applications
- Industrially scalable synthesis and manufacturing
- Long‑term availability supported by integrated precious‑metal sourcing
- Development and production supported by Umicore’s organometallic and process expertise
From metal to precursor – one integrated partner
Unlike many suppliers, Umicore controls the full value chain from precious‑metal sourcing and recycling to fine‑chemical synthesis and purification. This integrated approach helps ensure consistent quality, supply security, and alignment with your long‑term technology roadmap.
Looking ahead
The current ruthenium portfolio represents the first step in Umicore PMC’s broader Chemicals for Electronics (C4E) strategy. Additional ruthenium grades and further metal systems – including molybdenum‑based precursors – are under development to support emerging semiconductor process requirements.