ALD 2018

29 July - 1 August 2018

The 18th International Conference on Atomic Layer Deposition (ALD 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists.    

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Songdo Convensia

Central Street 123,  Yeonsu-Gu Incheon, Korea